On September 26, Guanshi Technology announced a stock issuance plan to raise up to ¥700 million, with ¥530 million allocated to a photomask manufacturing project and the remainder for working capital. This move strengthens its position in critical semiconductor materials.
Photomasks, often called the "film negatives" of chip production, are essential for lithography processes and directly determine chip precision and yield. While the domestic market is currently dominated by foreign suppliers—especially for advanced nodes below 28nm—Guanshi has already achieved mass production at 55nm and completed technology verification at 40nm. The new project will accelerate the establishment of a 28nm photomask production line, positioning the company at a crucial point between mature and advanced processes. Its Ningbo photomask team, composed of veterans from international leaders, has already generated over ¥7 million in revenue in the first half of 2025, validating its technical capabilities.
Once operational, the project will enhance supply chain security for key process equipment, improve product stability and delivery capabilities, and meet stringent requirements for nanometer-level precision and near-zero defects. The fundraising will also optimize the company’s financial structure, reduce its debt ratio, and support sustainable expansion.
ICgoodFind : This investment will accelerate the localization of high-end photomasks, positioning Guanshi Technology to gain an early advantage in domestic substitution.
