Aug 5 - PRINANO announced its self-developed PL-SR, China's first semiconductor-grade step-and-repeat nanoimprint lithography (NIL) system, was delivered to a domestic specialty process client on Aug 1.
The PL-SR series overcame key technical bottlenecks in inkjet coating, achieving nanoscale imprint film thickness. Its standout specs: average residual layer <10nm, residual layer variation <2nm, and imprint structure aspect ratio >7:1, supporting NIL processes with line width <10nm.
PRINANO noted the PL-SR series has completed R&D verification for memory chips, silicon-based microdisplays, silicon photonics (SiPh), and advanced packaging (AVP) chips. It enables uniform stitching of 20mm×20mm imprint templates, ultimately achieving 12-inch wafer-scale large templates.
ICgoodFind views this breakthrough as a significant boost to China's semiconductor lithography technology.
